Log in to see this item in other languages
Effect of RF magnetron sputtering conditions on microstructure and X-ray characteristics of yttria-stabilized zirconia thin films = Wpływ warunków sputeringu magnetronowego na mikrostrukturę i charakterystykę rentgenowską cienkich warstw dwutlenku cyrkonu stabilizowanego tlenkiem itru
Materiały Elektroniczne 1996 T.24 nr 2/3
Effect of RF magnetron sputtering conditions on microstructure and X-ray characteristics of yttria-stabilized zirconia thin films = Wpływ warunków sputeringu magnetronowego na mikrostrukturę i charakterystykę rentgenowską cienkich warstw dwutlenku cyrkonu stabilizowanego tlenkiem itru
Bibliogr. s. 41
Contributors
- De Gryse Roger
- De Roo Nico
- Haemers Johan
Creator
- Tomaszewski Henryk
Publisher
- ITME
Subject
- Electronic - journal - materials
- Electronic - materials
- magnetron sputtering
- XRD
- YSZ
Type of item
- article
Date
- 1996
- 1996
- 1996
Contributors
- De Gryse Roger
- De Roo Nico
- Haemers Johan
Creator
- Tomaszewski Henryk
Publisher
- ITME
Subject
- Electronic - journal - materials
- Electronic - materials
- magnetron sputtering
- XRD
- YSZ
Type of item
- article
Date
- 1996
- 1996
- 1996
Providing institution
Aggregator
Rights statement for the media in this item (unless otherwise specified)
- http://rightsstatements.org/vocab/InC/1.0/
Rights
- Rights Reserved - Free Access
- Copyright-protected material. May be used within the limits of statutory user freedoms
Current location
- _FBC
Source
- http://katalog.pan.pl/webpac-bin/218bitmeEN/wgbroker.exe?new+-access+top+search+open+NR+kv_5828
- ITME, sygn. dostępny
Extent
- 32-42 s. : il. ; 24 cm.
Format
- application/pdf
Language
- en
- en
Relations
- Electronic Materials
Year
- 1996
Providing country
- Poland
Collection name
First time published on Europeana
- 2017-11-30T10:06:16.745Z
Last time updated from providing institution
- 2017-11-30T10:06:16.745Z